US Unveils $825M EUV Accelerator to Bolster Semiconductor Innovation
The U.S. government is funding an $825 million EUV Accelerator at Albany NanoTech Complex to advance research in next-generation extreme ultraviolet (EUV) lithography and support U.S. semiconductor innovation. Rather than directly aiming to replicate ASML’s high-NA EUV expertise, the facility will focus on developing complementary technologies and processes that enhance U.S. capabilities around EUV lithography, a field currently dominated by Dutch tech leader ASML. Expected to collaborate with companies like Applied Materials, which specializes in semiconductor processing tools (but not EUV lithography itself), this initiative represents a strategic push by the U.S. to build a more self-sufficient semiconductor ecosystem. The Albany facility aims to start operations in 2025 to provide access to standard and high-NA EUV tools to accelerate semiconductor R&D, prototype faster, and strengthen the U.S. semiconductor workforce. By offering cutting-edge resources to National Semiconductor Technology Center (NSTC) members and fostering partnerships through NY Creates, the U.S. positions itself to compete globally, safeguard supply chains, and sustain tech leadership in a fiercely competitive market. NSTC membership provides organizations across the semiconductor ecosystem, including industry, academia, and government, the opportunity to collaborate on advancing semiconductor innovation, technology development, and commercialization efforts in the United States.
My Take
This move reflects a strategic push by the U.S. to reduce dependence on foreign semiconductor technology and bolster domestic innovation—an increasingly urgent goal in light of ongoing trade dynamics. High-numerical-aperture EUV lithography represents a critical advancement, and making it domestically accessible could lower prototyping costs, especially for U.S. startups in the semiconductor industry. With plans to provide access to high-NA EUV tools by 2026, the NSTC is poised to offer U.S. companies a collaborative environment for exploring this technology. Partnerships with firms like Applied Materials suggest that the EUV Accelerator could drive U.S.-led innovations, opening new opportunities for tech jobs and R&D advancements.
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Link to article:
https://www.eenewseurope.com/en/us-funds-1bn-centre-to-take-on-asml-in-euv-lithography/
Credit: eenews