Rapidus is accelerating its 2nm chip ambitions, planning to install 10 EUV lithography tools in Japan at its IIM-1 and IIM-2 fabs, according to TrendForce via Nikkan Kogyo Shimbun. The company received its first EUV tool in December 2024 and is targeting trial production at IIM-1 by April 2025, with sample deliveries to Broadcom by June. Mass production is slated for 2027, with IIM-2 following later. While the exact production capacity remains uncertain, estimates suggest that with five EUV machines, IIM-1 could produce 17,000–20,000 wafers per month, depending on process complexity and uptime. This marks a significant step in Japan’s push to re-establish itself as a major player in advanced semiconductor manufacturing. As of now, Rapidus has not publicly disclosed a detailed schedule for the installation of all 10 EUV lithography machines across its IIM-1 and IIM-2 facilities.

My Take

Rapidus’s aggressive EUV rollout highlights Japan’s determination to reclaim its semiconductor leadership, but success depends on overcoming talent shortages and supply chain constraints. If Rapidus can secure stable yields and high-volume production, it could be a serious competitor in chip manufacturing, challenging Taiwan and South Korea in the advanced node race.

#Semiconductors #EUV #2nm #Japan #ASML #ChipManufacturing #AIChips #TechNews #Broadcom

Link to article:

https://www.tomshardware.com/tech-industry/rapidus-to-reportedly-install-10-euv-litho-tools-into-its-fab-in-japan#

Credit: Tom’s Hardware

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